In ion beam technology scia Systems addresses the entire spectrum from ion beam milling and reactive ion beam etching to dual ion beam deposition. These processes are available with special source arrangements on platforms that accommodate all standard wafer sizes. The company also equips the optics industry with ultra-precise process systems. Particularly noteworthy are systems for the multilayer coating of x-ray optics, optics in the visible range and optics for extreme ultraviolet lithography (EUVL). Additionally, scia Systems also designs flexible and modular systems combining several vacuum process chambers into cluster and in-line solutions according to customer specific requirements and applications.
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